Review Article
Year : 2024 | Volume : 8 | Issue : 1 | Page : 1-9
Plasma Treatment as a Surface Additive for Improved Hydrophilicity on Titanium Dental Implant Surfaces
M Jasmine Crena1, Kavitha Sanjeev 2, Akanksha Agarwal 3
1,2,3-SRM Dental College, Barathi Salai, Ramapuram, Chennai, India 600125
Address for Correspondence:
Dr. M Jasmine Crena
SRM Dental College, Barathi Salai, Ramapuram,Chennai, India 600125
Email: jasminecrena@gmail.com
Abstract
Dielectric barrier discharge plasma treatment on implant surfaces allows for increased osseo-integration by way of improved cellular adhesion, proliferation and differentiation. The physicochemical properties including contact angle and hydrophilicity capacitate for additional benefits like immediate cell seeding thereby prolonging the time for native cells to migrate first, rather than bacterial inhabitation. The review is aimed at elaborating the literature on contact angle and hydrophilicity of implant surface with plasma treatment. A total of 32 articles were identified after digital search from databases like PubMed/ Medline, Elsevier, Cochrane Library. Bias analysis was performed using the RoB tool for animal interventional studies (SYRCLE’s RoB tool). The Bias analysis evaluating the contact angle and hydrophilicity showed that all the studies showed reduced contact angle and increased hydrophilicity. Thus all the studies show significant increase in contact angle thereby adding to the benefit of plasma treatment to be a major game changes in integration of biological implants.
Keywords: Plasma surface treatment, implant surface, osseointegration, contact angle, hydrophilicity
Financial support and sponsorship
Self-funded
Conflicts of interest
There are no conflicts of interest
How to cite this article: M , J. C., Sanjeev, K., & Agarwal, A. (2024). Plasma Treatment as a Surface Additive for Improved Hydrophilicity on Titanium Dental Implant Surfaces: Review Article. International Journal of Orofacial Biology, 8(1), 1–9. https://doi.org/10.56501/intjorofacbiol.v8i1.1100
